Software tool for temperature simulation in electron-beam lithography: TEMPTATION

Sergey V. Babin; Igor Yu. Kuzmin; G. Sergeev

doi:10.1117/12.301219

12 February 1997 Software tool for temperature simulation in electron-beam lithography: TEMPTATION

Sergey V. Babin, Igor Yu. Kuzmin, G. Sergeev

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Proceedings Volume 3236, 17th Annual BACUS Symposium on Photomask Technology and Management; (1997) https://doi.org/10.1117/12.301219
Event: 17th Annual BACUS Photomask Technology and Management, 1997, Redwood City, CA, United States

Abstract

Resist heating becomes a problem when using high-throughput electron-beam lithography (EBL). The TEMPTATION software tool was developed to simulate temperature change during electron- beam exposure. The software uses an original resist heating model that measures heat transfer through a multilayer resist and substrate. It has analytical formulas to provide fast numerical simulation of large patterns and a user-friendly Windows95 interface. The software is useful in the design of EBL systems and the development of new EBL processes.

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Sergey V. Babin, Igor Yu. Kuzmin, and G. Sergeev "Software tool for temperature simulation in electron-beam lithography: TEMPTATION", Proc. SPIE 3236, 17th Annual BACUS Symposium on Photomask Technology and Management, (12 February 1997); https://doi.org/10.1117/12.301219

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