Novel ArF photoresist system using acrylic polymer

Bang-Chein Ho; Jui-Fa Chang; Ting-Chung Liu; Jian-Hong Chen

doi:10.1117/12.312435

29 June 1998 Novel ArF photoresist system using acrylic polymer

Bang-Chein Ho, Jui-Fa Chang, Ting-Chung Liu, Jian-Hong Chen

Author Affiliations +

Proceedings Volume 3333, Advances in Resist Technology and Processing XV; (1998) https://doi.org/10.1117/12.312435
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

A novel resist for 193 nm lithography must be developed to fulfill the demands of future microelectronics fabrication processes. Enhancing 193 nm DUV single layer resist (SRL) materials has received extensive interest in recent years, which exclusively derivatized acrylic polymers due to the problem of absorption at 193 nm. In this work, we investigate acrylic polymers as a 193 nm DUV SLR material. Our acrylic polymer comprises of tertbutyl ester acid labile group and other groups. The resist system using the polymer displays a positive tone image in the presence of photoacid generator such as onium salts. This work also investigates the effects of acid number, acrylic polymer composition, molecular weight of acrylic polymer on 193 nm DUV SLR.

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Bang-Chein Ho, Jui-Fa Chang, Ting-Chung Liu, and Jian-Hong Chen "Novel ArF photoresist system using acrylic polymer", Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); https://doi.org/10.1117/12.312435

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