Deposition of carbon nitride thin films by IR-laser-induced reactions in carbon-nitrogen gas-phase compounds

Aurelian Crunteanu; Rodica Alexandrescu; Raluca Cireasa; S. Cojocaru; Ion G. Morjan; A. Andrei; Ashock Kumar

doi:10.1117/12.312751

2 July 1998 Deposition of carbon nitride thin films by IR-laser-induced reactions in carbon-nitrogen gas-phase compounds

Aurelian Crunteanu, Rodica Alexandrescu, Raluca Cireasa, S. Cojocaru, Ion G. Morjan, A. Andrei, Ashock Kumar

Author Affiliations +

Proceedings Volume 3405, ROMOPTO '97: Fifth Conference on Optics; (1998) https://doi.org/10.1117/12.312751
Event: ROMOPTO '97: Fifth Conference on Optics, 1997, Bucharest, Romania

Abstract

Since the theoretical studies of Liu and Cohen who predicted the existence of a superhard phase of carbon nitride, a great deal of effort was underdone in order to synthesize this hypothetical material with a nitrogen content as high as the 57% present in a (beta) -C₃N₄ structure. This study presents an attempt to produce CN_x thin films using the laser-induced CVD technique. CW CO₂ laser was used for irradiating various carbon-nitrogen containing mixtures such as C₂H₄/N₂O/NH₃. The CN_x films were grown alternatively on bare alumina ((alpha) - Al₂O₃) substrates and on pre-deposited Ti films. A comparative analysis of nitrogen incorporation in the films obtained in different experimental conditions was performed by means of the X-ray photoelectron spectroscopy. The same method was used to identify the chemical states of the CN system.

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Aurelian Crunteanu, Rodica Alexandrescu, Raluca Cireasa, S. Cojocaru, Ion G. Morjan, A. Andrei, and Ashock Kumar "Deposition of carbon nitride thin films by IR-laser-induced reactions in carbon-nitrogen gas-phase compounds", Proc. SPIE 3405, ROMOPTO '97: Fifth Conference on Optics, (2 July 1998); https://doi.org/10.1117/12.312751

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