Theoretical model for the reactive pulsed deposition process: application to the case of ablation of a Ti target in low-pressure N2

Johny Neamtu; Ion N. Mihailescu

doi:10.1117/12.312771

2 July 1998 Theoretical model for the reactive pulsed deposition process: application to the case of ablation of a Ti target in low-pressure N₂

Johny Neamtu, Ion N. Mihailescu

Author Affiliations +

Proceedings Volume 3405, ROMOPTO '97: Fifth Conference on Optics; (1998) https://doi.org/10.1117/12.312771
Event: ROMOPTO '97: Fifth Conference on Optics, 1997, Bucharest, Romania

Abstract

We introduce a theoretical model to describe all the phenomena implied in the interaction process between the high intensity UV laser radiation and a solid target in the ambience of a low- pressure chemically active gas. The action of the laser radiation upon the solid surface is simulated by solving the 1D heat equation. A hydrodynamical 1D model was further applied to describe the interaction between the laser radiation and the plasma expanding in front of the target. The absorption of the laser radiation in the vapor plasma could be considered with the aid of a multifluid model. The transit of the ablated atoms and/or of the new formed chemical compound was approached with a Monte-Carlo method. We could compute time and space distribution of the main plasma parameters (e.g. the plasma density and temperature). We could finally predict the thickness distribution of a film deposited on a collector placed parallel to the target at a distance of (1.5 - 3) cm range. The calculus was conducted for the case of a Ti target in low pressure nitrogen.

Citation Download Citation

Johny Neamtu and Ion N. Mihailescu "Theoretical model for the reactive pulsed deposition process: application to the case of ablation of a Ti target in low-pressure N₂", Proc. SPIE 3405, ROMOPTO '97: Fifth Conference on Optics, (2 July 1998); https://doi.org/10.1117/12.312771

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