Paper
13 October 1998 Near-field optical readout for phase-changed marks
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Abstract
We have observed near-field optical images of phase change marks and evaluated the readout signals including the optical near-field. Samples were composed of multilayered structures on glass substrates. Crystalline marks were recorded by a focused laser beam with an optical microscope in the as-deposited amorphous films. In readout, the optical and the topographical images of the recorded marks were evaluated at the same time by a collection mode near-field scanning optical microscope (NSOM). The surface profiles showed less than 1 nm dips around the marks. Therefore it means that the NSOM image of phase change marks depends on the refractive index change. The evaluated signal modulation of the optical image showed a sinusoidal curve to the top SiN layer thickness, and the maximum modulation was 60 percent.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Takashi Nakano, Junji Tominaga, and Nobufumi Atoda "Near-field optical readout for phase-changed marks", Proc. SPIE 3467, Far- and Near-Field Optics: Physics and Information Processing, (13 October 1998); https://doi.org/10.1117/12.326828
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Cited by 1 scholarly publication.
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KEYWORDS
Near field optics

Near field scanning optical microscopy

Modulation

Near field

Phase shift keying

Objectives

Refractive index

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