1998 mask industry quality assessment

Emilio P. Gonzalez-Lao

doi:10.1117/12.332863

18 December 1998 1998 mask industry quality assessment

Emilio P. Gonzalez-Lao

Proceedings Volume 3546, 18th Annual BACUS Symposium on Photomask Technology and Management; (1998) https://doi.org/10.1117/12.332863
Event: 18th Annual BACUS Symposium on Photomask Technology and Management, 1998, Redwood City, CA, United States

Abstract

The sixth annual mask industry assessment will survey numerous photomask companies for key performance measurements in the areas of safety, quality, delivery, and throughput time. The data compiled includes shipment volume, customer return rate, customer return reason, mask survival yield, delivery performance to schedule, throughput time, and safety incident rate from 1988 through Q2, 1998. New to the assessment is the addition of pellicle-related returns and pellicle failure reasons. The 1998 assessment contains data from eleven of the twelve 1997 participants and includes data from 3 new participants. Company identity remains protected by utilizing Arthur Anderson & Company to ensure confidentiality.

Citation Download Citation

Emilio P. Gonzalez-Lao "1998 mask industry quality assessment", Proc. SPIE 3546, 18th Annual BACUS Symposium on Photomask Technology and Management, (18 December 1998); https://doi.org/10.1117/12.332863

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