Paper
24 May 1999 Correlation of carrier lifetimes and arsenic-antisite defects in LT-GaAs grown at different substrate temperatures
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Abstract
Subpicosecond carrier lifetimes of arsenic-rich GaAs grown by molecular beam epitaxy at low substrate temperatures have been determined by time-resolved reflectivity. Effect of growth temperature on change of transient reflectivity and antisite defect concentration were also demonstrated. For the first time carrier lifetime as short as 0.13 ps was observed (resolution limited).
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Gong-Ru Lin, Tze-An Liu, and Ci-Ling Pan "Correlation of carrier lifetimes and arsenic-antisite defects in LT-GaAs grown at different substrate temperatures", Proc. SPIE 3624, Ultrafast Phenomena in Semiconductors III, (24 May 1999); https://doi.org/10.1117/12.349311
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KEYWORDS
Arsenic

Gallium arsenide

Reflectivity

Temperature metrology

Thermal effects

Ultrafast phenomena

Molecular beam epitaxy

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