X-ray and EUV laser-plasma sources based on cryogenic liquid-jet target

Lars Rymell; Magnus Berglund; Bjoern A. M. Hansson; Hans M. Hertz

doi:10.1117/12.351114

25 June 1999 X-ray and EUV laser-plasma sources based on cryogenic liquid-jet target

Lars Rymell, Magnus Berglund, Bjoern A. M. Hansson, Hans M. Hertz

Proceedings Volume 3676, Emerging Lithographic Technologies III; (1999) https://doi.org/10.1117/12.351114
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

We describe new high-brightness laser-plasma sources for x- ray and extreme UV (EUV) radiation. By utilizing a microscopic liquid-jet or liquid-droplet target the harmful emission of debris is significantly reduced or completely eliminated. The spectrum can be spectrally tailored by choosing a suitable liquid. In this paper we summarize our work on this type of source and include some recent developments on cryogenic liquified gases such as nitrogen and xenon. We believe that this new source is a suitable choice for EUV lithography as well as for proximity x-ray lithography.

Citation Download Citation

Lars Rymell, Magnus Berglund, Bjoern A. M. Hansson, and Hans M. Hertz "X-ray and EUV laser-plasma sources based on cryogenic liquid-jet target", Proc. SPIE 3676, Emerging Lithographic Technologies III, (25 June 1999); https://doi.org/10.1117/12.351114

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