High-resolution UV wavelength reticle contamination inspection

Franklin D. Kalk; William Waters Volk; James N. Wiley; Ed Hou; Sterling G. Watson

doi:10.1117/12.350872

14 June 1999 High-resolution UV wavelength reticle contamination inspection

Franklin D. Kalk, William Waters Volk, James N. Wiley, Ed Hou, Sterling G. Watson

Proceedings Volume 3677, Metrology, Inspection, and Process Control for Microlithography XIII; (1999) https://doi.org/10.1117/12.350872
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

A new reticle inspection system with laser UV imaging for contamination inspection has been developed to detect contamination defects on advanced reticles for DUV steppers and low k₁ lithography. The extension to UV wavelength improves the resolution of the imaging optics while maintaining compatibility with current STARlight inspection algorithms, thus improving both sensitivity and minimum linewidth capability. This enables inspection of reticles for 4X lithography design rules at 0.18 micrometers , 0.15 micrometers and 0.13 micrometers . The system also is capable of inspecting Tri-Tone PSM and reticles with OPC assist bars.

Citation Download Citation

Franklin D. Kalk, William Waters Volk, James N. Wiley, Ed Hou, and Sterling G. Watson "High-resolution UV wavelength reticle contamination inspection", Proc. SPIE 3677, Metrology, Inspection, and Process Control for Microlithography XIII, (14 June 1999); https://doi.org/10.1117/12.350872

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