CD performance of a new high-resolution laser pattern generator

Per Liden; Tomas Vikholm; Lars Kjellberg; Mans Bjuggren; Klas A. Edgren; John-Oscar Larson; Steven Haddleton; Per Askebjer

doi:10.1117/12.373335

30 December 1999 CD performance of a new high-resolution laser pattern generator

Per Liden, Tomas Vikholm, Lars Kjellberg, Mans Bjuggren, Klas A. Edgren, John-Oscar Larson, Steven Haddleton, Per Askebjer

Author Affiliations +

Proceedings Volume 3873, 19th Annual Symposium on Photomask Technology; (1999) https://doi.org/10.1117/12.373335
Event: Photomask Technology and Management, 1999, Monterey, CA, United States

Abstract

CD uniformity is one of the most critical parameters for mask making today. The mask error factor (MEF) in lithography for features that are smaller than the stepper wavelength means that any CD error is transferred to the wafer to a greater extent than the stepper reduction factor would indicate. CD results form a new laser pattern generator, the Omega6000 product line, will be presented. The system features an acousto-optic deflection architecture specifically designed to meet the CD requirements of 180 nm photomasks. A 0.86 NA final lens provides the high resolution of the system. The CD control and the high resolution makes the system well suited for today's advanced photomasks.

Citation Download Citation

Per Liden, Tomas Vikholm, Lars Kjellberg, Mans Bjuggren, Klas A. Edgren, John-Oscar Larson, Steven Haddleton, and Per Askebjer "CD performance of a new high-resolution laser pattern generator", Proc. SPIE 3873, 19th Annual Symposium on Photomask Technology, (30 December 1999); https://doi.org/10.1117/12.373335

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