High-energy photon lithography for fabrication of photonic devices

Sing Lee; Vladimir A. Kudryashov; Paul Choon Keat Lee; Mahe Liu; Tuck Lee Tan

doi:10.1117/12.369405

9 November 1999 High-energy photon lithography for fabrication of photonic devices

Sing Lee, Vladimir A. Kudryashov, Paul Choon Keat Lee, Mahe Liu, Tuck Lee Tan

Proceedings Volume 3899, Photonics Technology into the 21st Century: Semiconductors, Microstructures, and Nanostructures; (1999) https://doi.org/10.1117/12.369405
Event: International Symposium on Photonics and Applications, 1999, Singapore, Singapore

Abstract

Photonic crystals an other photonic devices could be efficiently produced using relatively simple and cheap Plasma Focus Pinch x-ray point sources, similar to the NX2. With this point x-ray source, it was demonstrated that with a proximity printing scheme, feature sizes less than 100 nm could be reproduced in a 500 nm UV3 CAR layer.

Citation Download Citation

Sing Lee, Vladimir A. Kudryashov, Paul Choon Keat Lee, Mahe Liu, and Tuck Lee Tan "High-energy photon lithography for fabrication of photonic devices", Proc. SPIE 3899, Photonics Technology into the 21st Century: Semiconductors, Microstructures, and Nanostructures, (9 November 1999); https://doi.org/10.1117/12.369405

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