Optical characterization in the vacuum ultraviolet with variable angle spectroscopic ellipsometry: 157 nm and below

James N. Hilfiker; Bhanwar Singh; Ron A. Synowicki; Corey L. Bungay

doi:10.1117/12.386495

2 June 2000 Optical characterization in the vacuum ultraviolet with variable angle spectroscopic ellipsometry: 157 nm and below

James N. Hilfiker, Bhanwar Singh, Ron A. Synowicki, Corey L. Bungay

Author Affiliations +

Proceedings Volume 3998, Metrology, Inspection, and Process Control for Microlithography XIV; (2000) https://doi.org/10.1117/12.386495
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

As device feature sizes shrink below 0.18 micrometer, shorter wavelength exposure tools are being investigated to meet the requirements for higher resolution. Understanding the optical properties of thin films and substrate materials at short wavelengths (193 nm, 157 nm, and shorter) will be necessary to develop the lithographic process. Variable Angle Spectroscopic Ellipsometry (VASE) offers nondestructive and precise measurement of thin film thickness and refractive index in the wavelength range from 146 nm to 1700 nm. VASE measurements provide a complete description of the thin film optical properties, which can be used to track process changes or variations in sample structure. Recent hardware innovations have extended VASE into the vacuum ultraviolet to meet lithography requirements at 157 nm.

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James N. Hilfiker, Bhanwar Singh, Ron A. Synowicki, and Corey L. Bungay "Optical characterization in the vacuum ultraviolet with variable angle spectroscopic ellipsometry: 157 nm and below", Proc. SPIE 3998, Metrology, Inspection, and Process Control for Microlithography XIV, (2 June 2000); https://doi.org/10.1117/12.386495

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