Gauging the performance of an in-situ interferometer

Mark Terry; Adlai H. Smith; Ken Rebitz

doi:10.1117/12.388960

5 July 2000 Gauging the performance of an in-situ interferometer

Mark Terry, Adlai H. Smith, Ken Rebitz

Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.388960
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

Recently, an in-situ technique for measuring exposure tool projection lens aberrations was introduced by Litel Instruments. In this study we attempt to gauge the performance of the interferometer through comparison of simulated lithographic patterns using the wavefronts measured by the interferometer, with experimental data collected from printed wafers. Our results compare simulation and experiment for cases of field curvature, lithographic astigmatism, linewidth abnormality, and dense- iso bias. As an additional gauge, we show that the change in the measured focus and 3rd order spherical aberration terms followed the theoretical trend for changing position along the optical axis.

Citation Download Citation

Mark Terry, Adlai H. Smith, and Ken Rebitz "Gauging the performance of an in-situ interferometer", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.388960

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