Miniaturized tin oxide (SnOx) sensor by using oxygen-plasma-treated thin film technique

Kun Lian; Zhong Geng Ling; Jiechao Jiang

doi:10.1117/12.385525

9 May 2000 Miniaturized tin oxide (SnO_x) sensor by using oxygen-plasma-treated thin film technique

Kun Lian, Zhong Geng Ling, Jiechao Jiang

Proceedings Volume 4077, International Conference on Sensors and Control Techniques (ICSC 2000); (2000) https://doi.org/10.1117/12.385525
Event: International Conference on Sensors and Control Techniques (ICSC2000), 2000, Wuhan, China

Abstract

A new processing technique for thin film tin oxide gas sensor has been described in this paper. Oxygen plasma is used as film sensitizing tool, in which the temperature only goes up to 190 degree(s)C for a short time. By using this technique, the tin oxide thin film sensors with smooth, uniform surface have been made with a reasonable sensitivity to the CO gas at room temperature. The oxygen plasma treatment decreases both film resistivity and film grain size. This new technique makes the tin oxide sensor fabrication compatible with the microelectronic processing.

Citation Download Citation

Kun Lian, Zhong Geng Ling, and Jiechao Jiang "Miniaturized tin oxide (SnO_x) sensor by using oxygen-plasma-treated thin film technique", Proc. SPIE 4077, International Conference on Sensors and Control Techniques (ICSC 2000), (9 May 2000); https://doi.org/10.1117/12.385525

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