Highly accurate CD control at stitching region for electron-beam projection lithography

Tomoharu Fujiwara; Takeshi Irita; Sumito Shimizu; Hajime Yamamoto; Kazuaki Suzuki

doi:10.1117/12.436696

20 August 2001 Highly accurate CD control at stitching region for electron-beam projection lithography

Tomoharu Fujiwara, Takeshi Irita, Sumito Shimizu, Hajime Yamamoto, Kazuaki Suzuki

Proceedings Volume 4343, Emerging Lithographic Technologies V; (2001) https://doi.org/10.1117/12.436696
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

For electron beam projection lithography system, it is one of the most important issues to stitch desired patterns accurately. We have found a way to stitch the patterns with high accurate critical dimension by a pattern edge deformation that moderates a stitching error by as much as 2.5 times compared with no-deformed edge.

Citation Download Citation

Tomoharu Fujiwara, Takeshi Irita, Sumito Shimizu, Hajime Yamamoto, and Kazuaki Suzuki "Highly accurate CD control at stitching region for electron-beam projection lithography", Proc. SPIE 4343, Emerging Lithographic Technologies V, (20 August 2001); https://doi.org/10.1117/12.436696

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