Optical transparency of SiO2 glass in vacuum ultraviolet region and defect formation by F2 laser

Hideo Hosono; T. Kinoshita; Yoshiaki Ikuta; K. Kajihara; Masahiro Hirano

doi:10.1117/12.425069

12 April 2001 Optical transparency of SiO₂ glass in vacuum ultraviolet region and defect formation by F₂ laser

Hideo Hosono, T. Kinoshita, Yoshiaki Ikuta, K. Kajihara, Masahiro Hirano

Proceedings Volume 4347, Laser-Induced Damage in Optical Materials: 2000; (2001) https://doi.org/10.1117/12.425069
Event: Laser-Induced Damage in Optical Materials: 2000, 2000, Boulder, CO, United States

Abstract

Vacuum ultraviolet (vuv) absorption edge and defect formation by F₂ excimer laser irradiation in synthetic SiO₂ glasses, which have no detectable amount of point defects, were found to be controlled by the physical disorder of the network structure. The vuv edge shifts to a long wavelength side with increasing the fraction of 3- or 4-membered ring structures that are composed of strained Si- O-Si bonds. The defect formation by F₂ laser irradiation occurs via one-photon absorption processes and the primarily created defects are a pair of E' center and non-bridging oxygen hole center. The ratio of saturated defect concentrations created by the irradiation is close to that of the fraction of 3- or 4-membered ring structures in the network structure. The present results demonstrate that physical disorder primarily controls the transparency in the vuv regime and damage sensitivity to F₂ laser pulse.

Citation Download Citation

Hideo Hosono, T. Kinoshita, Yoshiaki Ikuta, K. Kajihara, and Masahiro Hirano "Optical transparency of SiO₂ glass in vacuum ultraviolet region and defect formation by F₂ laser", Proc. SPIE 4347, Laser-Induced Damage in Optical Materials: 2000, (12 April 2001); https://doi.org/10.1117/12.425069

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