Development of microelectromechanical varactors

Chun-Hsien Lee; Shu-Hui Tsai; Chung-Hsien Lin; Ryutaro Maeda; Jiunn-Jye Tsaur; Kuan-Jen Fang; Ju-Mei Lu; Cheng-Kuo Lee; Weileun Fang

doi:10.1117/12.425389

5 April 2001 Development of microelectromechanical varactors

Chun-Hsien Lee, Shu-Hui Tsai, Chung-Hsien Lin, Ryutaro Maeda, Jiunn-Jye Tsaur, Kuan-Jen Fang, Ju-Mei Lu, Cheng-Kuo Lee, Weileun Fang

Author Affiliations +

Proceedings Volume 4408, Design, Test, Integration, and Packaging of MEMS/MOEMS 2001; (2001) https://doi.org/10.1117/12.425389
Event: Design, Test, Integration, and Packaging of MEMS/MOEMS 2001, 2001, Cannes-Mandelieu, France

Abstract

A varactor with a wide tuning range is essential to adjust the desired frequency band among a wide Gigahertz range and compensate for process deviation as well as effects of temperature. Nowadays, conventional varactors with high quality cannot be available in standard silicon processes; furthermore, they cannot avoid high losses at high frequencies due to the nature of semiconductors. A novel micromachined varactor with a wide tuning range is presented. It can provide a digital selection of capacitance. The electroplating process was singled out to fabricate such as device, with its feature of high aspect ratio. The design has been verified through a finite-element analysis to show a tuning range of 350%.

Citation Download Citation

Chun-Hsien Lee, Shu-Hui Tsai, Chung-Hsien Lin, Ryutaro Maeda, Jiunn-Jye Tsaur, Kuan-Jen Fang, Ju-Mei Lu, Cheng-Kuo Lee, and Weileun Fang "Development of microelectromechanical varactors", Proc. SPIE 4408, Design, Test, Integration, and Packaging of MEMS/MOEMS 2001, (5 April 2001); https://doi.org/10.1117/12.425389

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