Paper
5 September 2001 Fabry-Perot-type antireflective coating for deep-ultraviolet binary photomask application
Hsuen-Li Chen, Chien-Kui Hsu, Ben-Chang Chen, Fu-Hsiang Ko, Tiao-Yuan Huang, Tien-Chi Chu
Author Affiliations +
Abstract
In this paper, we demonstrated a novel anti-reflective coating structure for deep ultraviolet binary mask, which is based on three-layer Fabry-Perot Structure. The anti- reflective coating structure is composed of the chrome/oxide/chrome stack. By adding different optimized structures, reflectance of less than 2% at both 248nm and 193nm have been achieved. The results are also agreed well with simulated ones. At the three-layer Fabry-Perot structure, the thickness of bottom chrome layer should be larger than 100 nm to provide suitable absorption. By controlling the thickness of the intermediate oxide layer, we can tune the minimum reflection regime to the desired exposure wavelength. The thickness of top chrome layer should be well controlled in order to optimize transmission light into Fabry-Perot structures. In general, the mask layer should have good electrical conductivity for e-beam writing in order to prevent writing errors due to charging effects. In the Fabry-Perot structure, the top metal layer can also prevent charge accumulation during e-beam writing.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hsuen-Li Chen, Chien-Kui Hsu, Ben-Chang Chen, Fu-Hsiang Ko, Tiao-Yuan Huang, and Tien-Chi Chu "Fabry-Perot-type antireflective coating for deep-ultraviolet binary photomask application", Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); https://doi.org/10.1117/12.438347
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KEYWORDS
Fabry–Perot interferometers

Reflectivity

Antireflective coatings

Photomasks

Oxides

Binary data

Deep ultraviolet

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