Defect printability analysis of attenuated PSM using PASStm

Yumiko Maenaka; Norihiko Takatsu; Ichiro Kagami; Daichi Kakuta

doi:10.1117/12.458322

11 March 2002 Defect printability analysis of attenuated PSM using PASStm

Yumiko Maenaka, Norihiko Takatsu, Ichiro Kagami, Daichi Kakuta

Proceedings Volume 4562, 21st Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.458322
Event: Photomask 2001, 2001, Monterey, CA, United States

Abstract

130nm design rule and 100nm design rule device fabrication bring a whole new challenge to the mask makers. The critically small k1 value and correspondingly large MEEF (Mask Error Enhancement Factor) value impose an ever-higher quality requirement on the reticles. The higher emphasis on time-to-market of the semiconductor business environment only complicates the matter further. Mask makers are not only required to supply higher quality reticles, but also in a shorter period of time. Since its introduction, the concept of simulating the stepper/scanner by software has steadily gained popularity as the potential solution to meet the challenge. The experimental result of the previous version of PASS (Printability Analysis Stepper Simulator) with the binary mask had shown promising results. However, people are expecting Attenuated Phase Shifting Mask (AttPSM) simulation capability, since AttPSM is currently the most commonly used reticles for the critical layers-the place where PASS is needed the most. PASS V2.X extends its stepper simulation capability to AttPSM. We have prepared AttPSM test masks having programmed for 180nm and 130nm design rules. Each defect area was inspected with KLA-Tencor's 365UV-HR inspection system to acquire defect coordinates and images, simulated with PASS using the images, simulated with AIMS and finally printed on wafer. In this study we discuss the results and see how these simulations and images correlate with each other.

Citation Download Citation

Yumiko Maenaka, Norihiko Takatsu, Ichiro Kagami, and Daichi Kakuta "Defect printability analysis of attenuated PSM using PASStm", Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); https://doi.org/10.1117/12.458322

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available