Comparison of ATHENA and TTL alignment capability in product wafers

Juliann Opitz; David W. Laidler

doi:10.1117/12.473411

16 July 2002 Comparison of ATHENA and TTL alignment capability in product wafers

Juliann Opitz, David W. Laidler

Proceedings Volume 4689, Metrology, Inspection, and Process Control for Microlithography XVI; (2002) https://doi.org/10.1117/12.473411
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Semiconductor manufactures using ASML exposure tool shave traditionally used a zero layer mark approach and Through- the-lens (TTL) alignment system to align all production layers of a device. Future ASML exposure tools will no longer have the TTL system and will exclusively employ ATHENA, which is an off-axis alignment system utilizing two wavelengths and higher diffraction orders. In anticipation of this conversion, an evaluation has been performed using IDT's standard alignment scheme to compare the performance of ATHENA to that of TTL for the alignment of the Gate layer to the STI layer. Standard XPA and higher diffraction order enhanced XPA mark types were evaluated using the zero layer approach, as well as non-zero layer enhanced scribeline SPM marks. TTL alignment to both standard and enhanced XPA marks showed a good alignment capability, with enhanced marks showing a slight improvement over standard marks. ATHENA alignment to XPA marks gave similar results, although the red wavelength was shown to be slightly more stable than the green. CMP and thin film stack splits showed no significant correlation to alignment capability for any mode or mark type.

Citation Download Citation

Juliann Opitz and David W. Laidler "Comparison of ATHENA and TTL alignment capability in product wafers", Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); https://doi.org/10.1117/12.473411

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available