Paper
16 July 2002 Productivity enhancements in recipe creation for overlay metrology measurements
Vincent Vachellerie, Delia Ristoiu, Alain G. Deleporte, Marc Poulingue, Yannick Bedin, Rolf Arendt, Ganesh Sundaram, Paul C. Knutrud
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Abstract
As the number of varied devices produced by a fab increase, coupled with an increased complexity in those devices which call for an ever increasing number of process layers, in- line process control via metrology can become an impossible task, unless metrology recipe management schemes are implemented. Logic fabs are now introducing more than 1 new device per day, which can result in the writing and management of thousands of recipes, which in turn can lead to the costly consumption of tool and personnel resources sand a general loss in productivity. In this paper we present the productivity gains to be made in the recipe creation process through off-line recipe generation, as well as a method of decreasing the recipe optimization time. We will also outline the concept of Just In Time recipe creation, its contribution to productivity gains, and its generalized implementation with respect to Overlay Metrology recipes.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Vincent Vachellerie, Delia Ristoiu, Alain G. Deleporte, Marc Poulingue, Yannick Bedin, Rolf Arendt, Ganesh Sundaram, and Paul C. Knutrud "Productivity enhancements in recipe creation for overlay metrology measurements", Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); https://doi.org/10.1117/12.473492
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KEYWORDS
Semiconducting wafers

Metrology

Overlay metrology

Time metrology

Optical alignment

Metals

Niobium

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