EPL mask fabrication

Michael J. Lercel; Carey T. Williams; Mark Lawliss; Robin Ackel; Louis Kindt; Emily Fisch

doi:10.1117/12.477008

1 August 2002 EPL mask fabrication

Michael J. Lercel, Carey T. Williams, Mark Lawliss, Robin Ackel, Louis Kindt, Emily Fisch

Proceedings Volume 4754, Photomask and Next-Generation Lithography Mask Technology IX; (2002) https://doi.org/10.1117/12.477008
Event: Photomask and Next Generation Lithography Mask Technology IX, 2002, Yokohama, Japan

Abstract

The next generation lithography, either electron or photon based, will be first introduced on critical levels for device manufacture. These levels have different requirements for difficulty of meeting image size uniformity, image placement, and patterning requirements on masks. Membrane masks are needed for electron projection lithography (EPL), and the fabrication of membrane masks generates new requirements such as the need for complementary mask pairs for stencil masks. In this paper, we discuss experiments for fabricating EPL masks for device levels.

Citation Download Citation

Michael J. Lercel, Carey T. Williams, Mark Lawliss, Robin Ackel, Louis Kindt, and Emily Fisch "EPL mask fabrication", Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); https://doi.org/10.1117/12.477008

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