Femtosecond pulse damage and predamage behavior of dielectric thin films

Mark Mero; Jianhua Liu; Ali Sabbah; Jayesh C. Jasapara; Kai Starke; Detlev Ristau; John K. McIver; Wolfgang G. Rudolph

doi:10.1117/12.501361

30 May 2003 Femtosecond pulse damage and predamage behavior of dielectric thin films

Mark Mero, Jianhua Liu, Ali Sabbah, Jayesh C. Jasapara, Kai Starke, Detlev Ristau, John K. McIver, Wolfgang G. Rudolph

Author Affiliations +

Proceedings Volume 4932, Laser-Induced Damage in Optical Materials: 2002 and 7th International Workshop on Laser Beam and Optics Characterization; (2003) https://doi.org/10.1117/12.501361
Event: XXXIV Annual Symposium on Optical Materials for High Power Lasers: Boulder Damage Symposium, 2002, Boulder, CO, United States

Abstract

The damage behavior of five different oxide dielectric thin films (Ta₂O₅, TiO₂, Al₂O₃, HfO₂, and SiO₂) has been investigated with ultrashort laser pulses with durations from 25 fs to 1 ps. At all pulse durations the damage threshold is well defined and scales with the bandgap energy of the material. The damage behavior can be described with a phenomenological model taking into account multi-photon excitation, impact ionization, and electron relaxation. The temporal evolution of the dielectric constant of the film following the excitation with pulses below the damage threshold has been measured with time-resolved pump-probe spectroscopy. The complex dielectric constant was retrieved from transient reflection and transmission data.

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Mark Mero, Jianhua Liu, Ali Sabbah, Jayesh C. Jasapara, Kai Starke, Detlev Ristau, John K. McIver, and Wolfgang G. Rudolph "Femtosecond pulse damage and predamage behavior of dielectric thin films", Proc. SPIE 4932, Laser-Induced Damage in Optical Materials: 2002 and 7th International Workshop on Laser Beam and Optics Characterization, (30 May 2003); https://doi.org/10.1117/12.501361

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