Paper
9 April 2003 Study on the near-field recording spot
Xiandeng Pei, You-xin Xia, Hao Huang, Changsheng Xie, Haiwei Wang
Author Affiliations +
Proceedings Volume 5060, Sixth International Symposium on Optical Storage (ISOS 2002); (2003) https://doi.org/10.1117/12.510579
Event: Sixth International Symposium on Optical Storage (ISOS 2002), 2002, Wuhan, China
Abstract
Evanescent energy can be used to get extremely small optical spots. For the data storage applications, optical near field is defined in terms of Evanescent coupling between the system used to read or write data and recording layer. Near-field techniques can be applied to optical data storage systems to greatly increase recording density. So near-field recording technique has great potential in optical disc recording system and hybrid recording system. The characteristic of near-field recording spot is of vital importance in the data storage system basing the near-field theory, so it is absolutely necessary to be analyzed and measured. This paper analyses characteristic of near-field spots. The heat response time of the near field to overcome super paramagnetic effect is calculated basing the heat transfer theory. A novel measuring method for the diameter of near-field recording spot is also presented. Since the grain of the recording media is tiny enough, with the aid of atomic force microscope (AFM), near-field optical lithography can be accomplished. The diameter of near-field recording spot can be obtained by specifically designed computer either. So the relationship between the near-field recording spot diameter and the probe size of near-field recording system, the near field recording distance coupling between head and disc can be got.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xiandeng Pei, You-xin Xia, Hao Huang, Changsheng Xie, and Haiwei Wang "Study on the near-field recording spot", Proc. SPIE 5060, Sixth International Symposium on Optical Storage (ISOS 2002), (9 April 2003); https://doi.org/10.1117/12.510579
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KEYWORDS
Near field

Near field optics

Lithography

Atomic force microscopy

Data storage

Free space optics

Pulsed laser operation

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