Paper
10 November 2003 Novel pulse-repetitive technological CO2 laser for nano-powders and thin film production
M. G. Ivanov, V. V. Osipov, V. V. Platonov, V. V. Lisenkov, Y. A. Kotov
Author Affiliations +
Proceedings Volume 5120, XIV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers; (2003) https://doi.org/10.1117/12.515839
Event: XIV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 2002, Wroclow, Poland
Abstract
The paper reports about a new pulse-repetitive high-efficient technological CO2-laser and its applications. An original method of active medium excitation was used for laser pumping. Efficiency of the laser constructed on the basis of this method reached 12%, average radiation power 600 W, pulse power ~ 10 kW. The laser was used for YSZ powders production by successive evaporation and crystallization in the gas stream. The output rate was 15-20g/h, specific surface of the powder was up to 70m2/g. Evaporation of materials by CO2 laser was also used for ZrO2 and Al2O3 thin films deposition on stainless steel plates. The average thickness of the film was ~500nm, the deposition rate was ~10nm on the area ~1cm2 per pulse. The deposited films have high adhesion properties.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. G. Ivanov, V. V. Osipov, V. V. Platonov, V. V. Lisenkov, and Y. A. Kotov "Novel pulse-repetitive technological CO2 laser for nano-powders and thin film production", Proc. SPIE 5120, XIV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, (10 November 2003); https://doi.org/10.1117/12.515839
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KEYWORDS
Particles

Carbon dioxide lasers

Carbon dioxide

Plasma

Laser applications

Pulsed laser operation

Thin film deposition

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