Spectroscopic ellipsometry of TiO2/Si

Gintautas J. Babonas; Ahti Niilisk; Alfonsas Reza; Algirdas Matulis; Arnold Rosental

doi:10.1117/12.515700

8 August 2003 Spectroscopic ellipsometry of TiO₂/Si

Gintautas J. Babonas, Ahti Niilisk, Alfonsas Reza, Algirdas Matulis, Arnold Rosental

Proceedings Volume 5122, Advanced Organic and Inorganic Optical Materials; (2003) https://doi.org/10.1117/12.515700
Event: 2003 Chapter books, 2003, Bellingham, WA, United States

Abstract

In order to characterize TiO₂ films in terms of the overall optical response, spectroscopic ellipsometry studies of the system TiO₂/Si were carried out. The films were grown by the atomic-layer chemical vapor deposition on Si(111) substrates. Optical measurements were performed by means of a photometric ellipsometer with rotating analyzer. Experimental results have been analyzed using multilayer and pseudodielectric function approximations.

Citation Download Citation

Gintautas J. Babonas, Ahti Niilisk, Alfonsas Reza, Algirdas Matulis, and Arnold Rosental "Spectroscopic ellipsometry of TiO₂/Si", Proc. SPIE 5122, Advanced Organic and Inorganic Optical Materials, (8 August 2003); https://doi.org/10.1117/12.515700

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available