Paper
28 May 2004 Full optical column characterization of DUV lithographic projection tools
Mark A. van de Kerkhof, Wim de Boeij, Haico Kok, Marianna Silova, Jan Baselmans, Marcel Hemerik
Author Affiliations +
Abstract
Advanced optical systems for low k1 lithography require accurate characterisation of various imaging parameters to insure that OPC strategies can be maintained. Among these parameters lens aberrations and illumination profiles are the most important optical column charcteristics. The phase measurement interferometer hardware (ILIAS: Integrated Lens Interferometer At Scanner) integrated into high-NA ArF lithographic projection tools opens novel pathways to measure and control tool critical performance parameters. In this presentation we address new extensions of this in-line tool that will allow the measurement of optical parameters of the full optical column. The primary functionality of the ILIAS system is to measure and analyse wavefront aberrations across the full image field with high accuracy and speed. In this paper performance data of the in-line wavefront sensor over multiple high-NA ArF lithographic systems is presented. In addition to the acquisition of wavefront aberrations in terms of Zernike polynomials, detailed measurements of high resolution wavefronts are now possible. Examples of such wavefronts and PSD analysis thereof are presented. Besides the projection lens properties, the detailed shape of the pupil distribution and transmission (apodisation) becomes critical for system optimization. The integrated ILIAS hardware can also be used to measure these parameters.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mark A. van de Kerkhof, Wim de Boeij, Haico Kok, Marianna Silova, Jan Baselmans, and Marcel Hemerik "Full optical column characterization of DUV lithographic projection tools", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.536331
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CITATIONS
Cited by 30 scholarly publications and 19 patents.
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KEYWORDS
Lithography

Wavefronts

Reticles

Imaging systems

Phase measurement

Scanners

Semiconducting wafers

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