Enhancement of unified mask data formats for EB writers

Toshio Suzuki; Junji Hirumi; Nobuyuki Yoshioka; Yutaka Hojyo; Yuichi Kawase; Shinji Sakamoto; Koki Kuriyama; Syogo Narukawa; Morihisa Houga

doi:10.1117/12.579130

6 December 2004 Enhancement of unified mask data formats for EB writers

Toshio Suzuki, Junji Hirumi, Nobuyuki Yoshioka, Yutaka Hojyo, Yuichi Kawase, Shinji Sakamoto, Koki Kuriyama, Syogo Narukawa, Morihisa Houga

Author Affiliations +

Proceedings Volume 5567, 24th Annual BACUS Symposium on Photomask Technology; (2004) https://doi.org/10.1117/12.579130
Event: Photomask Technology, 2004, Monterey, California, United States

Abstract

We have developed a unified mask data format named “OASIS.NEO¹” for Variable-Shaped-Beam (VSB) EB writers as enhancement of unified mask data format named “NEO²”. OASIS.NEO is a pattern data format based on OASIS^TM3 released as GDSII replacement by SEMI. We have developed OASIS.NEO for practical use of unified mask data formats in mask data preparation (MDP) flow. For practical use, it is necessary to input OASIS.NEO data directly to VSB EB writers just like the native EB data. So we have defined restrictions on OASIS for VSB EB writers referring the restrictions in NEO based on GDSII named “GDSII.NEO⁴”. In this paper we proposed the specification of OASIS.NEO.

Citation Download Citation

Toshio Suzuki, Junji Hirumi, Nobuyuki Yoshioka, Yutaka Hojyo, Yuichi Kawase, Shinji Sakamoto, Koki Kuriyama, Syogo Narukawa, and Morihisa Houga "Enhancement of unified mask data formats for EB writers", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); https://doi.org/10.1117/12.579130

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