Interferometric lithography at 46.9 nm

M. G. Capeluto; Georgiy O. Vaschenko; Michael E. Grisham; Mario C. Marconi; Carmen S. Menoni; Jorge J.G. Rocca; S. Luduena; L. Pietrasanta

doi:10.1117/12.592201

21 October 2004 Interferometric lithography at 46.9 nm

M. G. Capeluto, Georgiy O. Vaschenko, Michael E. Grisham, Mario C. Marconi, Carmen S. Menoni, Jorge J.G. Rocca, S. Luduena, L. Pietrasanta

Author Affiliations +

Proceedings Volume 5622, 5th Iberoamerican Meeting on Optics and 8th Latin American Meeting on Optics, Lasers, and Their Applications; (2004) https://doi.org/10.1117/12.592201
Event: 5th Iberoamerican Meeting on Optics and 8th Latin American Meeting on Optics, Lasers, and Their Applications, 2004, Porlamar, Venezuela

Abstract

We present the first results of nano-patterning in poly-methyl methacrylate (PMMA) photo-resist using a 46.9 nm tabletop extreme ultraviolet (EUV) laser. As a proof of principle, we recorded a Fresnel diffraction pattern of a copper mesh with 19 μm square holes. Results of ongoing interference experiments will also be presented.

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M. G. Capeluto, Georgiy O. Vaschenko, Michael E. Grisham, Mario C. Marconi, Carmen S. Menoni, Jorge J.G. Rocca, S. Luduena, and L. Pietrasanta "Interferometric lithography at 46.9 nm", Proc. SPIE 5622, 5th Iberoamerican Meeting on Optics and 8th Latin American Meeting on Optics, Lasers, and Their Applications, (21 October 2004); https://doi.org/10.1117/12.592201

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