Study on photodamage of In:Er:LiNbO3 crystal waveguide substrates

Wusheng Xu; Yuheng Xu; Jian Zhang

doi:10.1117/12.574202

3 January 2005 Study on photodamage of In:Er:LiNbO₃ crystal waveguide substrates

Wusheng Xu, Yuheng Xu, Jian Zhang

Proceedings Volume 5643, Advances in Optical Data Storage Technology; (2005) https://doi.org/10.1117/12.574202
Event: Photonics Asia, 2004, Beijing, China

Abstract

In:Er:LiNbO₃ crystals with fixed Er concentration of 1mol% and variable In concentration of 1mol%, 2mol% and 3mol% have been grown by the Czochralski method, and then was made into waveguide substrates. The directly observing facula method was employed to measure the photo-damage resistance ability of the substrates, and it is found that In(3mol%):Er:LiNbO₃ has the highest photo-damage resistance ability among these three substrates. The structure was determined by the infrared transmittance spectra and the UV absorption spectra. The mechanism that the photo-damage resistance ability of the substrates increases with the increase of the doped concentration of In was discussed via the structure of the crystal.

Citation Download Citation

Wusheng Xu, Yuheng Xu, and Jian Zhang "Study on photodamage of In:Er:LiNbO₃ crystal waveguide substrates", Proc. SPIE 5643, Advances in Optical Data Storage Technology, (3 January 2005); https://doi.org/10.1117/12.574202

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