Excimer laser conditionning of KDP: influence of the laser parameters and crystal orientation on the laser damage threshold

David Damiani; Herve Piombini; Daniel Plessis; Thierry Donval; Laurent Lamaignere; Marc Loiseau

doi:10.1117/12.584707

21 February 2005 Excimer laser conditionning of KDP: influence of the laser parameters and crystal orientation on the laser damage threshold

David Damiani, Herve Piombini, Daniel Plessis, Thierry Donval, Laurent Lamaignere, Marc Loiseau

Author Affiliations +

Proceedings Volume 5647, Laser-Induced Damage in Optical Materials: 2004; (2005) https://doi.org/10.1117/12.584707
Event: Boulder Damage Symposium XXXVI, 2004, Boulder, Colorado, United States

Abstract

We perform thne conditioning of various KDP crystals with a XeF excimer laser working at 351 nm. We determine the maximum available excimer laser fluence for conditioning without damage initiation within the crystal. We demonstrate enhancement of the damage resistance with the increase of the cumulative excimer laser fluence. Using the conditioning parameters we show that the damage resistance is also dependent on the crystalline orientation of the KDP samples.

Citation Download Citation

David Damiani, Herve Piombini, Daniel Plessis, Thierry Donval, Laurent Lamaignere, and Marc Loiseau "Excimer laser conditionning of KDP: influence of the laser parameters and crystal orientation on the laser damage threshold", Proc. SPIE 5647, Laser-Induced Damage in Optical Materials: 2004, (21 February 2005); https://doi.org/10.1117/12.584707

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