Three-dimensional measurement by tilting and moving objective lens in CD-SEM(III)

K. Abe; Y. Tsuruga; S. Okada; T. Noma; H. Aoki; H. Fujii; H. Koike; A. Hamaguchi; Y. Yamazaki

doi:10.1117/12.600336

10 May 2005 Three-dimensional measurement by tilting and moving objective lens in CD-SEM(III)

K. Abe, Y. Tsuruga, S. Okada, T. Noma, H. Aoki, H. Fujii, H. Koike, A. Hamaguchi, Y. Yamazaki

Proceedings Volume 5752, Metrology, Inspection, and Process Control for Microlithography XIX; (2005) https://doi.org/10.1117/12.600336
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Necessity of nondestructive three-dimensional measurement methodology has increased. We propose three-dimensional measurement by CD-SEM with T-MOL (Tilting and Moving Objective Lens) electron optics system. We designed the new objective lens, and confirmed that the new electron optics system provides 3.0nm resolution at tilting angle of 10 degrees. Moreover, we developed the multi-matching technique based on the several stereographical tilted images. In this paper, we report the comparison between the new technique and the conventional one, as well as the technique’s capability using the actual semiconductor devices.

Citation Download Citation

K. Abe, Y. Tsuruga, S. Okada, T. Noma, H. Aoki, H. Fujii, H. Koike, A. Hamaguchi, and Y. Yamazaki "Three-dimensional measurement by tilting and moving objective lens in CD-SEM(III)", Proc. SPIE 5752, Metrology, Inspection, and Process Control for Microlithography XIX, (10 May 2005); https://doi.org/10.1117/12.600336

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