Experimental measurements of diffraction for periodic patterns by 193-nm polarized radiation compared to rigorous EMF simulations

Marylyn Hoy Bennett; Andrew Grenville; Scott D. Hector; Shane R. Palmer; Leonardus H. A. Leunissen; Vicky Philipsen; Theodore M. Bloomstein; Dennis E. Hardy; Mordechai Rothschild; James N. Hilfiker

doi:10.1117/12.600098

12 May 2005 Experimental measurements of diffraction for periodic patterns by 193-nm polarized radiation compared to rigorous EMF simulations

Marylyn Hoy Bennett, Andrew Grenville, Scott D. Hector, Shane R. Palmer, Leonardus H. A. Leunissen, Vicky Philipsen, Theodore M. Bloomstein, Dennis E. Hardy, Mordechai Rothschild, James N. Hilfiker

Author Affiliations +

Proceedings Volume 5754, Optical Microlithography XVIII; (2005) https://doi.org/10.1117/12.600098
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Polarization dependent diffraction efficiencies in transmission through gratings on specially designed masks with pitch comparable to the wavelength were measured using an angle-resolved scatterometry apparatus with a 193 nm excimer source. Four masks - two binary, one alternating and one attenuated phase shift mask - were included in the experimental measurements. The validity of models used in present commercially available simulation packages and additional polarization effects were evaluated against the experimental scattering efficiencies.

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Marylyn Hoy Bennett, Andrew Grenville, Scott D. Hector, Shane R. Palmer, Leonardus H. A. Leunissen, Vicky Philipsen, Theodore M. Bloomstein, Dennis E. Hardy, Mordechai Rothschild, and James N. Hilfiker "Experimental measurements of diffraction for periodic patterns by 193-nm polarized radiation compared to rigorous EMF simulations", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); https://doi.org/10.1117/12.600098

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