Thirty years of lithography simulation

Chris A. Mack

doi:10.1117/12.601590

12 May 2005 Thirty years of lithography simulation

Chris A. Mack

Proceedings Volume 5754, Optical Microlithography XVIII; (2005) https://doi.org/10.1117/12.601590
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Thirty years ago Rick Dill and his team at IBM published the first account of lithography simulation - the accurate description of semiconductor optical lithography by mathematical equations. Since then, lithography simulation has grown dramatically in importance in four important areas: as a research tool, as a development tool, as a manufacturing tool, and as a learning tool. In this paper, the history of lithography simulations is traced from its roots to today’s indispensable tools for lithographic technology development. Along the way, an attempt will be made to define the true value of lithography simulation to the semiconductor industry.

Citation Download Citation

Chris A. Mack "Thirty years of lithography simulation", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); https://doi.org/10.1117/12.601590

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