Near-field holography with a two-dimensional phase mask for fabrication of two-dimensional structures in a single exposure step

H. Hartung; T. Clausnitzer; E.-B. Kley; A. Tünnermann

doi:10.1117/12.625105

19 October 2005 Near-field holography with a two-dimensional phase mask for fabrication of two-dimensional structures in a single exposure step

H. Hartung, T. Clausnitzer, E.-B. Kley, A. Tünnermann

Author Affiliations +

Proceedings Volume 5965, Optical Fabrication, Testing, and Metrology II; 596505 (2005) https://doi.org/10.1117/12.625105
Event: Optical Systems Design 2005, 2005, Jena, Germany

Abstract

We present a technique for the fabrication of small period structures using a near field holography setup. Using a two-dimensionally structured phase mask, the creation of two-dimensional hole or dot arrays was possible with one single exposure step. In order to get a high contrast interference pattern, the mask parameters were optimized by rigorous calculation to achieve equal transmission efficiency in the respective diffraction orders. The mask generation was done by electron beam lithography and ion beam etching. We have made exposures with two different setups. The first setup is an exposure with normal incidence, where the interference of the four first diffraction orders is used. The second setup uses the zeroth and first diffraction order interference of a conical incident beam.

Citation Download Citation

H. Hartung, T. Clausnitzer, E.-B. Kley, and A. Tünnermann "Near-field holography with a two-dimensional phase mask for fabrication of two-dimensional structures in a single exposure step", Proc. SPIE 5965, Optical Fabrication, Testing, and Metrology II, 596505 (19 October 2005); https://doi.org/10.1117/12.625105

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