Paper
24 March 2006 Multilayer optics with spectral purity layers for the EUV wavelength range
E. Louis, R. W .E. van de Kruijs, A. E. Yakshin, S. Alonso van der Westen, F. Bijkerk, M. M. J. W. van Herpen, D. J. W. Klunder, L. Bakker, H. Enkisch, S. Müllender, M. Richter, V. Banine
Author Affiliations +
Abstract
Reported are the first calculations and experimental results of the deposition of EUV multilayer coatings that actively suppress the reflectance in the VUV wavelength range. In the undesired 100-200 nm band a factor of five reduction was achieved for one single optical element, while only a minor loss of 4.5% reflectance for λ = 13.5 nm, the operating wavelength of EUVL, was found.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
E. Louis, R. W .E. van de Kruijs, A. E. Yakshin, S. Alonso van der Westen, F. Bijkerk, M. M. J. W. van Herpen, D. J. W. Klunder, L. Bakker, H. Enkisch, S. Müllender, M. Richter, and V. Banine "Multilayer optics with spectral purity layers for the EUV wavelength range", Proc. SPIE 6151, Emerging Lithographic Technologies X, 615139 (24 March 2006); https://doi.org/10.1117/12.675132
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Cited by 3 scholarly publications.
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KEYWORDS
Multilayers

Reflectivity

Extreme ultraviolet

EUV optics

Optical components

Extreme ultraviolet lithography

Mirrors

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