Error factor in bottom CD measurement for contact hole using CD-SEM

Hideaki Abe; Yuichiro Yamazaki

doi:10.1117/12.659555

24 March 2006 Error factor in bottom CD measurement for contact hole using CD-SEM

Hideaki Abe, Yuichiro Yamazaki

Proceedings Volume 6152, Metrology, Inspection, and Process Control for Microlithography XX; 61524H (2006) https://doi.org/10.1117/12.659555
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

CD control of hole bottom becomes more difficult with pattern size shrinkage. Since local CD variation of hole patterns is large, CD measurement by CD-SEM is needed for measuring the local CD. Although a technique of observing the hole bottom by CD-SEM has been reported, accuracy of bottom CD measurement is seldom examined. We estimated the tool precision and CD bias required for highly accurate CD control. As a result, the bottom CD measurement repeatability was examined for 0.94nm. Tool precision has sufficient capability for hp45 node. Si transfer process was the technique used for estimating CD bias. CD bias obtained by Si transfer process was constant in the bottom CD range of 45 nm or more. The above result indicates bottom CD measurement using CD-SEM has sufficient capability for measuring bottom CD correctly for hp45 node.

Citation Download Citation

Hideaki Abe and Yuichiro Yamazaki "Error factor in bottom CD measurement for contact hole using CD-SEM", Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61524H (24 March 2006); https://doi.org/10.1117/12.659555

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