Fast and accurate non-contact in situ optical metrology for end-point detection

Wojciech J. Walecki; Alexander Pravdivstev; Manuel Santos II; Ann Koo

doi:10.1117/12.675342

14 August 2006 Fast and accurate non-contact in situ optical metrology for end-point detection

Wojciech J. Walecki, Alexander Pravdivstev, Manuel Santos II, Ann Koo

Proceedings Volume 6292, Interferometry XIII: Techniques and Analysis; 629211 (2006) https://doi.org/10.1117/12.675342
Event: SPIE Optics + Photonics, 2006, San Diego, California, United States

Abstract

We present design of novel tool for end point detection of wafer thickness, and wafer topography employing low coherence fiber optic interferometer, which optical length of the reference arm of the interferometer is monitored by secondary long coherence length interferometer.

Citation Download Citation

Wojciech J. Walecki, Alexander Pravdivstev, Manuel Santos II, and Ann Koo "Fast and accurate non-contact in situ optical metrology for end-point detection", Proc. SPIE 6292, Interferometry XIII: Techniques and Analysis, 629211 (14 August 2006); https://doi.org/10.1117/12.675342

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available