A specialized cell-wise OPC method for OPC-unfriendly spot detection

Ye Chen; Zheng Shi

doi:10.1117/12.728938

12 May 2007 A specialized cell-wise OPC method for OPC-unfriendly spot detection

Ye Chen, Zheng Shi

Proceedings Volume 6607, Photomask and Next-Generation Lithography Mask Technology XIV; 66070O (2007) https://doi.org/10.1117/12.728938
Event: Photomask and Next-Generation Lithography Mask Technology XIV, 2007, Yokohama, Japan

Abstract

To reduce design spin time, OPC-unfriendly spots in IC layout should be found out by designer before tapeout. This can be done by firstly running a "trial OPC" step on the layout, followed by running an ORC step to verify the result. In this paper we introduce a specialized cell-wise OPC method using an edge bias modeling method to improve the accuracy while keeping the advantage on correction speed, which is dozens of times faster than traditional model-based OPC method. This makes the algorithm a good choice for "trial OPC".

Citation Download Citation

Ye Chen and Zheng Shi "A specialized cell-wise OPC method for OPC-unfriendly spot detection", Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 66070O (12 May 2007); https://doi.org/10.1117/12.728938

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