Optimization of OPC runtime using efficient optical simulation

Mohamed Al-Imam; Walid A. Tawfic

doi:10.1117/12.746608

30 October 2007 Optimization of OPC runtime using efficient optical simulation

Mohamed Al-Imam, Walid A. Tawfic

Proceedings Volume 6730, Photomask Technology 2007; 67302T (2007) https://doi.org/10.1117/12.746608
Event: SPIE Photomask Technology, 2007, Monterey, California, United States

Abstract

Model-Based Optical Proximity Correction (MBOPC) is now found in nearly all resolution enhancement recipes used in leading technology integrated circuit fabrication facilities. Many masks now have critical dimensions less than the exposure wavelength, which results in light diffraction that distorts the image projected onto the wafer. The industry is relying more and more on MBOPC to compensate for optical effects that are induced during the exposure of these masks. The MBOPC operation is usually the highest computational time contributor in the RET flow. MBOPC procedures include the fragmentation of layout edges longer than a specific value into a number of sub-edges (fragments). The software engine can move and manipulate each fragment to improve the image transferred to the wafer. In the sparse MBOPC approach, each fragment receives one or more optical simulation sites, which is a one-dimensional array of points where light intensity is sampled and calculated. To correctly capture the resist behavior at each simulation site, there must be enough points to ensure extension of the site to a certain distance from the fragment. Adding more points beyond this distance does not add any benefit, but can significantly increase the runtime. This paper presents an automated method that analyzes layouts for different technology nodes that depend on sparse simulations as their MBOPC engine, and reports the optimized number of simulation points that need to be in the simulation site to get the desired accuracy and optimum runtime performance.

Citation Download Citation

Mohamed Al-Imam and Walid A. Tawfic "Optimization of OPC runtime using efficient optical simulation", Proc. SPIE 6730, Photomask Technology 2007, 67302T (30 October 2007); https://doi.org/10.1117/12.746608

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available