Free modulation of defect states in multilayer structures consisting of epsilon-negative material and mu-negative material

Qiong Wang; Changchun Yan; Lingling Zhang; Yiping Cui

doi:10.1117/12.792246

11 March 2008 Free modulation of defect states in multilayer structures consisting of epsilon-negative material and mu-negative material

Qiong Wang, Changchun Yan, Lingling Zhang, Yiping Cui

Author Affiliations +

Proceedings Volume 6984, Sixth International Conference on Thin Film Physics and Applications; 69843S (2008) https://doi.org/10.1117/12.792246
Event: Sixth International Conference on Thin Film Physics and Applications, 2007, Shanghai, China

Abstract

By means of introducing defect layers into multilayer structures composed by epsilon-negative material and mu-negative material, the free modulation of single and double localized modes in zero-φ_eff gap is realized respectively through adjusting the thickness of different kinds of defect layers in two designed structures. In addition, the defect modes in the zero-φ_eff gap, being distinct from those in the Bragg gap, have the property of insensitivity to incident angle and polarization in some degree, which would be applied widely in tunable omnidirectional filters.

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Qiong Wang, Changchun Yan, Lingling Zhang, and Yiping Cui "Free modulation of defect states in multilayer structures consisting of epsilon-negative material and mu-negative material", Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 69843S (11 March 2008); https://doi.org/10.1117/12.792246

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