Large-area plasmonic structures fabricated by laser nanopatterning and their applications

M. H. Hong; C. H. Liu; F. Ma; Z. C. Chen; B. Luk'yanchuk; L. P. Shi; T. C. Chong

doi:10.1117/12.810460

24 February 2009 Large-area plasmonic structures fabricated by laser nanopatterning and their applications

M. H. Hong, C. H. Liu, F. Ma, Z. C. Chen, B. Luk'yanchuk, L. P. Shi, T. C. Chong

Proceedings Volume 7202, Laser-based Micro- and Nanopackaging and Assembly III; 72020K (2009) https://doi.org/10.1117/12.810460
Event: SPIE LASE: Lasers and Applications in Science and Engineering, 2009, San Jose, California, United States

Abstract

Laser interference lithography is applied to fabricate large-area plasmonic nanostructures. This approach has the advantages of being non-contact process in air and able to achieve large-area and maskless nanolithography at a high speed with low system investment. Single layer Au or Ag noble metallic thin film and Ag/Au, Ag/Ni or Au/Ni bimetallic layer thin films are patterned into nano-dot, nano-rod and nano-nut arrays by laser interference lithography. Plasmonic effects of the fabricated metallic nanostructures are studied. Tunable and multi-peak surface plasmon resonances of these nanostructures can be obtained, which have potential applications in solar cells, bio-sensing and photonic circuits.

Citation Download Citation

M. H. Hong, C. H. Liu, F. Ma, Z. C. Chen, B. Luk'yanchuk, L. P. Shi, and T. C. Chong "Large-area plasmonic structures fabricated by laser nanopatterning and their applications", Proc. SPIE 7202, Laser-based Micro- and Nanopackaging and Assembly III, 72020K (24 February 2009); https://doi.org/10.1117/12.810460

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