Analysis of Kohler illumination for 193 nm scatterfield microscope

Yeung Joon Sohn; Richard Quintanilha; Lowell Howard; Richard M. Silver

doi:10.1117/12.816624

23 March 2009 Analysis of Köhler illumination for 193 nm scatterfield microscope

Yeung Joon Sohn, Richard Quintanilha, Lowell Howard, Richard M. Silver

Proceedings Volume 7272, Metrology, Inspection, and Process Control for Microlithography XXIII; 72723T (2009) https://doi.org/10.1117/12.816624
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

A scatterfield microscope using 193 nm laser light was developed that utilizes angle-resolved illumination for high resolution optical metrology. An angle scan module was implemented that scans the illumination beam in angle space at the sample by linearly scanning a fiber aperture at a conjugate back focal plane. The illumination light is delivered directly from a source laser via an optical fiber in order to achieve homogeneous angular illumination. A unique design element is that the conjugate back focal plane (CBFP) is telecentric allowing the optical axis of the fiber to be scanned linearly. Initial results from full field and angle-resolved illumination are presented and potential applications in semiconductor metrology are described.

Citation Download Citation

Yeung Joon Sohn, Richard Quintanilha, Lowell Howard, and Richard M. Silver "Analysis of Köhler illumination for 193 nm scatterfield microscope", Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 72723T (23 March 2009); https://doi.org/10.1117/12.816624

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