Nanopolishing: parameters and techniques

Aurelian Ovidius I. Trufasu; Virginia Maduta; Cristina Liliana Trufasu

doi:10.1117/12.823667

7 January 2009 Nanopolishing: parameters and techniques

Aurelian Ovidius I. Trufasu, Virginia Maduta, Cristina Liliana Trufasu

Proceedings Volume 7297, Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies IV; 72971L (2009) https://doi.org/10.1117/12.823667
Event: Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies IV, 2008, Constanta, Romania

Abstract

The thermal regime had to meet two needs: to be big enough for a fast polishing and small enough not to influence the support or piece. The dilatation coefficient is different for pieces and support make a modification of outside topography which influence the final shape of surface, consequently ΔN. The present study propose to establish a link between temperature uniformity in the same time on piece or polishing device surface, respectively, final quality of topography polished surface.

Citation Download Citation

Aurelian Ovidius I. Trufasu, Virginia Maduta, and Cristina Liliana Trufasu "Nanopolishing: parameters and techniques", Proc. SPIE 7297, Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies IV, 72971L (7 January 2009); https://doi.org/10.1117/12.823667

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available