The impact of total measurement uncertainty (TMU) on overlay error correction

Jangho Shin; Jeongho Yeo; Young-Seog Kang; Woosung Han

doi:10.1117/12.845823

1 April 2010 The impact of total measurement uncertainty (TMU) on overlay error correction

Jangho Shin, Jeongho Yeo, Young-Seog Kang, Woosung Han

Proceedings Volume 7638, Metrology, Inspection, and Process Control for Microlithography XXIV; 76382F (2010) https://doi.org/10.1117/12.845823
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

The motivation of this work is to suggest a guide-line to define a practical overlay metrology requirement for a given design rule. Total measurement uncertainty, TMU, of an overlay metrology is defined as the square root of square sum of following items: tool induced shift (TIS)-mean, TIS-3 sigma, dynamic precision, and tool-to-tool match. It is important to remind that the TMU depends on process conditions, thus TMU is different layer by layer. In this study, the impact of TMU on overlay error correction, which includes process and measurement noise, is investigated in terms of the stability of high order overlay correction parameters. By defining the variation range of correctable parameters as a figure of merit, corresponding TMU is determined for a given design rule. By implementing this methodology, 2 nm of TMU value is obtained for 45 nm of DRAM half pitch, based upon simulation results. Similarly, 1.0 nm of TMU requirement is suggested for 36 nm of DRAM half pitch. Detailed methodology and simulation results are discussed.

Citation Download Citation

Jangho Shin, Jeongho Yeo, Young-Seog Kang, and Woosung Han "The impact of total measurement uncertainty (TMU) on overlay error correction", Proc. SPIE 7638, Metrology, Inspection, and Process Control for Microlithography XXIV, 76382F (1 April 2010); https://doi.org/10.1117/12.845823

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
5 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Overlay metrology

Semiconducting wafers

Data modeling

Optical lithography

Semiconductors

Inspection

Lithography

Show All Keywords

Keywords/Phrases

Search In:

Publication Years