Abbe-PCA-SMO: microlithography source and mask optimization based on Abbe-PCA

Jason Hsih-Chie Chang; Charlie Chung-Ping Chen; Lawrence S. Melvin III

doi:10.1117/12.846615

12 March 2010 Abbe-PCA-SMO: microlithography source and mask optimization based on Abbe-PCA

Jason Hsih-Chie Chang, Charlie Chung-Ping Chen, Lawrence S. Melvin III

Proceedings Volume 7640, Optical Microlithography XXIII; 764026 (2010) https://doi.org/10.1117/12.846615
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

Resolution enhancement technologies (RETs) are so far widely proposed in improving the quality of micro-lithography process. Latest methods such as source mask optimization (SMO) and inverse lithography technology (ILT) are gaining popularity recently. Therefore, high speed simulator is in strong demand for growing computational complexity of RETs. In this paper, we demonstrate that our previously proposed Abbe-PCA is highly efficient for source configuring and pixel-based ILT mask tuning.

Citation Download Citation

Jason Hsih-Chie Chang, Charlie Chung-Ping Chen, and Lawrence S. Melvin III "Abbe-PCA-SMO: microlithography source and mask optimization based on Abbe-PCA", Proc. SPIE 7640, Optical Microlithography XXIII, 764026 (12 March 2010); https://doi.org/10.1117/12.846615

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available