Lithography cycle time improvements using short-interval scheduling

David Norman; Scott Watson; Michael Anderson; Steve Marteney; Ben Mehr

doi:10.1117/12.848442

12 March 2010 Lithography cycle time improvements using short-interval scheduling

David Norman, Scott Watson, Michael Anderson, Steve Marteney, Ben Mehr

Proceedings Volume 7640, Optical Microlithography XXIII; 76403B (2010) https://doi.org/10.1117/12.848442
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

Partially and fully automated semiconductor manufacturing facilities around the world have employed automated real-time dispatchers (RTD) as a critical element of their factory management solutions. The success of RTD is attributable to a detailed and extremely accurate data base that reflects the current state of the factory, consistently applied dispatching policies and continuous improvement of these dispatching policies. However, many manufactures are now reaching the benefit limits of pure dispatching-based or other "heuristic-only" solutions. A new solution is needed that combines locally optimized short-interval schedules with RTD policies to target further reductions in product cycle time. This paper describes an integrated solution that employs four key components: 1. real-time data generation, 2. simulation-based prediction, 3. locally optimized short-interval scheduling, and 4. schedule-aware real-time dispatching. The authors describe how this solution was deployed in lithography and wet / diffusion areas, and report the resulting improvements measured.

Citation Download Citation

David Norman, Scott Watson, Michael Anderson, Steve Marteney, and Ben Mehr "Lithography cycle time improvements using short-interval scheduling", Proc. SPIE 7640, Optical Microlithography XXIII, 76403B (12 March 2010); https://doi.org/10.1117/12.848442

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