Paper
25 April 2012 Absorbing photonic crystals for mono-crystalline silicon thin film solar cells
Xianqin Meng, Valerie Depauw, Guillaume Gomard, Ounsi El Daif, Christos Trompoukis, Emmanuel Drouard, Cécile Jamois, Alain Fave, Frederic Dross, Ivan Gordon, Christian Seassal
Author Affiliations +
Abstract
In this paper, we present the integration of an absorbing photonic crystal within a monocrystalline silicon thin film solar cell stack. Optical simulations performed on a complete solar cell revealed that patterning the epitaxial monocrystalline silicon active layer as a 1D and 2D photonic crystal enabled to increase its integrated absorption by 38%rel and 50%rel in the whole 300-1100 nm range, compared to a similar but unpatterned stack. In order to fabricate such promising cells, a specific fabrication process based on holographic lithography, inductively coupled plasma etching and reactive ion etching has been developed and implemented to obtain such photonic crystal patterned solar cells. Optical measurements performed on the patterned stacks highlight the significant absorption enhancement, as expected by simulation. A more advanced structuration combining a front and a rear 1D binary photonic patterning with different periods is designed, enabling a 60%abs larger absorption in silicon.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xianqin Meng, Valerie Depauw, Guillaume Gomard, Ounsi El Daif, Christos Trompoukis, Emmanuel Drouard, Cécile Jamois, Alain Fave, Frederic Dross, Ivan Gordon, and Christian Seassal "Absorbing photonic crystals for mono-crystalline silicon thin film solar cells", Proc. SPIE 8425, Photonic Crystal Materials and Devices X, 84250R (25 April 2012); https://doi.org/10.1117/12.922428
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Absorption

Solar cells

Photonic crystals

Silicon

Optical lithography

Aluminum

Reactive ion etching

Back to Top