Coherent diffractive imaging microscope with a tabletop high harmonic EUV source

Bosheng Zhang; Matthew D. Seaberg; Daniel E. Adams; Dennis F. Gardner; Margaret M. Murnane; Henry C. Kapteyn

doi:10.1117/12.2011615

18 April 2013 Coherent diffractive imaging microscope with a tabletop high harmonic EUV source

Bosheng Zhang, Matthew D. Seaberg, Daniel E. Adams, Dennis F. Gardner, Margaret M. Murnane, Henry C. Kapteyn

Proceedings Volume 8681, Metrology, Inspection, and Process Control for Microlithography XXVII; 86810H (2013) https://doi.org/10.1117/12.2011615
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

Coherent diffractive imaging (CDI) using EUV/X-rays has proven to be a powerful microscopy method for imaging nanoscale objects. In traditional CDI, the oversampling condition limits its applicability to small, isolated objects. A new technique called keyhole CDI was demonstrated on a synchrotron X-ray source to circumvent this limitation. Here we demonstrate the first keyhole CDI result with a tabletop extreme ultraviolet (EUV) source. The EUV source is based on high harmonic generation (HHG), and our modified form of keyhole CDI uses a highly reflective curved EUV mirror instead of a lossy Fresnel zone plate, offering a ~10x increase in photon throughput of the imaging system, and a more uniform illumination on the sample. In addition, we have demonstrated a record 22 nm resolution using our tabletop CDI setup, and also the successful extension to reflection mode for a periodic sample. Combining these results with keyhole CDI will open the path to the realization of a compact EUV microscope for imaging general non-isolated and non-periodic samples, in both transmission and reflection mode.

Citation Download Citation

Bosheng Zhang, Matthew D. Seaberg, Daniel E. Adams, Dennis F. Gardner, Margaret M. Murnane, and Henry C. Kapteyn "Coherent diffractive imaging microscope with a tabletop high harmonic EUV source", Proc. SPIE 8681, Metrology, Inspection, and Process Control for Microlithography XXVII, 86810H (18 April 2013); https://doi.org/10.1117/12.2011615

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