Paper
27 March 2014 How to design a good photoresist solvent package using solubility parameters and high-throughput research
Michael P. Tate, Charlotte Cutler, Mike Sakillaris, Michael Kaufman, Thomas Estelle, Carol Mohler, Chris Tucker, Jim Thackeray
Author Affiliations +
Abstract
Understanding fundamental properties of photoresists and how interactions between photoresist components affect performance targets are crucial to the continued success of photoresists. More specifically, polymer solubility is critical to the overall performance capability of the photoresist formulation. While several theories describe polymer solvent solubility, the most common industrially applied method is Hansen’s solubility parameters. Hansen’s method, based on regular solution theory, describes a solute’s ability to dissolve in a solvent or solvent blend using four physical properties determined experimentally through regression of solubility data in many known solvents. The four physical parameters are dispersion, polarity, hydrogen bonding, and radius of interaction. Using these parameters a relative cohesive energy difference (RED), which describes a polymer’s likelihood to dissolve in a given solvent blend, may be calculated. Leveraging a high throughput workflow to prepare and analyze the thousands of samples necessary to calculate the Hansen’s solubility parameters from many different methacrylate-based polymers, we compare the physical descriptors to reveal a large range of polarities and hydrogen bonding. Further, we find that Hansen’s model correctly predicts the soluble/insoluble state of 3-component solvent blends where the dispersion, polar, hydrogen-bonding, and radius of interaction values were determined through regression of experimental values. These modeling capabilities have allowed for optimization of the photoresist solubility from initial blending through application providing valuable insights into the nature of photoresist.
© (2014) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael P. Tate, Charlotte Cutler, Mike Sakillaris, Michael Kaufman, Thomas Estelle, Carol Mohler, Chris Tucker, and Jim Thackeray "How to design a good photoresist solvent package using solubility parameters and high-throughput research", Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 90510R (27 March 2014); https://doi.org/10.1117/12.2045974
Lens.org Logo
CITATIONS
Cited by 1 scholarly publication.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Polymers

Photoresist materials

Hydrogen

Process modeling

Magnesium

Semiconductors

Statistical analysis

Back to Top